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Patent Application Titled "Vapor Deposition Apparatus, Deposition Method, and Method of Manufacturing Organic Light-Emitting Display Apparatus by...

September 11, 2014



Patent Application Titled "Vapor Deposition Apparatus, Deposition Method, and Method of Manufacturing Organic Light-Emitting Display Apparatus by Using the Same" Published Online

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Jung, Suk-Won (Yongin-City, KR); Huh, Myung-Soo (Yongin-City, KR); Jang, Choel-Min (Yongin-City, KR), filed on July 17, 2013, was made available online on August 28, 2014.

The assignee for this patent application is Samsung Display Co., Ltd.

Reporters obtained the following quote from the background information supplied by the inventors: "Embodiments of the present invention relate to a vapor deposition apparatus and a method of manufacturing an organic light-emitting display apparatus.

"A semiconductor device, a display apparatus, and other electronic devices include a plurality of thin films. There are various methods of forming such a plurality of thin films. One of such various methods is a vapor deposition method.

"The vapor deposition method employs one or more gases as a raw material for forming a thin film. The vapor deposition method includes various methods such as chemical vapor deposition (CVD) or atomic layer deposition (ALD).

"With regard to the ALD method, one raw material is injected and purged/pumped. Then, a single molecular layer or a multiple molecular layer is adsorbed onto a substrate. Then, another raw material is injected and purged/pumped. Thus, a desired single atomic layer is formed or multiple atomic layers are formed.

"An organic light-emitting display apparatus, as compared to other types of display apparatuses, provides a rapid response, as well as a wide view angle and an excellent contrast. Thus, the organic light-emitting display apparatus is drawing attention as a next-generation display apparatus.

"The organic light-emitting display apparatus includes an intermediate layer having an organic light-emitting layer between a first electrode and a second electrode which face each other, and further includes one or more various thin films. A deposition process may be used in order to form the one or more thin films in the organic light-emitting display apparatus.

"However, as the size of the organic light-emitting display apparatus increases, it becomes more difficult to deposit large-sized thin films while maintaining desired characteristics such as high resolution. Additionally, there is a limit on improving an efficiency of a process of forming such thin films."

In addition to obtaining background information on this patent application, VerticalNews editors also obtained the inventors' summary information for this patent application: "One or more embodiments of the present invention provide a vapor deposition apparatus for efficiently preventing or substantially preventing contamination of a deposition space and improving characteristics of a deposition layer, a deposition method, and a method of manufacturing an organic light-emitting display apparatus.

"According to an aspect of the present invention, there is provided a vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.

"The insulating member may be separated from the plasma generator by an inserting member located between the plasma generator and the insulating member.

"A space between the plasma generator and the insulating member may be substantially sealed by the inserting member.

"The inserting member may include a first inserting member adjacent one end of the plasma generator, and a second inserting member adjacent an opposing end of the plasma generator, and wherein a space between the first inserting member and the second inserting member, between the plasma generator and the insulating member, may be substantially sealed by the first inserting member and the second inserting member.

"The inserting member may have elasticity.

"The inserting member may be an O-ring.

"The plasma generator may be an electrode.

"The plasma generator may have a generally column shape.

"The insulating member may be a hollow column.

"The insulating member may include a quartz or ceramic material.

"The insulating member may surround an entire external surface of the plasma generator.

"A first injector may be coupled to the reaction space and configured to inject a deposition raw material onto the substrate, the deposition raw material including a radical form of the first raw material gas.

"A connection unit may be between the reaction space and the first injector, the connection unit having a narrower width than the first injector.

"A second injector may be adjacent the first injector, the second injector being separated from the first injector.

"The second injector may be configured to inject a second raw material or a purge gas toward a direction of the substrate for forming the deposition layer.

"A second injector and a third injector may be adjacent to and separated from the first injector, and respectively on opposing sides of the first injector.

"The second injector and the third injector may be respectively configured to inject one selected from the group consisting of a purge gas, a second raw material, and a third raw material, in a direction toward the substrate.

"A plurality of exhausts may be adjacent to each of the first injector, the second injector, and the third injector.

"The plurality of exhausts may include a first exhaust between the first injector and the second injector, and a second exhaust between the first injector and the third injector.

"The substrate and the vapor deposition apparatus may be configured to move with respect to each other.

"According to another embodiment of the present invention, there is provided a vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus including: a plurality of first regions, a plurality of second regions, and a plurality of purge units, wherein each of the plurality of first regions includes: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator; wherein each of the plurality of second regions is configured to inject a second raw material in a direction toward the substrate; and wherein the purge units are configured to inject a purge gas in a direction toward the substrate.

"Each purge unit, among the plurality of purge units, may be between the first region and the second region.

"A plurality of exhaust units may be adjacent the first regions, the second regions, and the purge units.

"According to another aspect of the present invention, there is provided a method of forming a deposition layer on a substrate, the method including: supplying a first raw material gas from a supply unit to a reaction space; changing at least a portion of the first raw material gas into a radical form, by generating a plasma using a plasma generator in the reaction space; and injecting a first raw depositing material onto the substrate, the first raw depositing material including a radical form, wherein the changing of at least a portion of the first raw material gas into a radical form includes substantially preventing electrons or ions, which are generated when the plasma is generated, from accelerating and colliding with the plasma generator using an insulating member separate from and surrounding the plasma generator.

"The substrate and the vapor deposition apparatus may be configured to move with respect to each other and execute a deposition process.

"According to another aspect of the present invention, there is provided a method of manufacturing an organic light-emitting display apparatus by using a vapor deposition apparatus, wherein the organic light-emitting display apparatus includes a first electrode, an intermediate layer which includes an organic light-emitting layer, a second electrode, and an encapsulation layer, wherein forming at least one thin film of the organic light-emitting display apparatus includes: positioning a substrate to correspond to the vapor deposition apparatus; supplying a first raw material gas from a supply unit of the vapor deposition apparatus to a reaction space; changing at least a portion of the first raw material gas into a radical form, by generating a plasma using a plasma generator in the reaction space; and injecting a first raw depositing material into the substrate, the first raw depositing material including a radical form, wherein the changing at least a portion of the first raw material gas into a radical form includes substantially preventing electrons or ions, which are generated when the plasma is generated, from accelerating and colliding with the plasma generator using an insulating member separated from and surrounding the plasma generator.

"The forming of the thin film of the organic light-emitting display may include forming the encapsulation layer on the second electrode.

"The forming of the thin film of the organic light-emitting display may include forming an insulating layer.

"The forming of the thin film of the organic light-emitting display may include forming a conductive layer.

BRIEF DESCRIPTION OF THE DRAWINGS

"The above and other features and aspects of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings in which:

"FIG. 1 is a schematic diagram illustrating a vapor deposition apparatus, according to an embodiment of the present invention;

"FIG. 2 is an exploded oblique view illustrating a plasma generation unit and an insulating member of FIG. 1;

"FIG. 3 is a cross-sectional view of the vapor deposition apparatus taken along the line III-III of FIG. 1;

"FIG. 4 is a schematic plan view illustrating a vapor deposition apparatus, according to another embodiment of the present invention;

"FIG. 5 is a schematic plan view illustrating a vapor deposition apparatus, according to another embodiment of the present invention;

"FIG. 6 is a schematic plan view illustrating a vapor deposition apparatus, according to another embodiment of the present invention;

"FIG. 7 is a schematic cross-sectional view illustrating an organic light-emitting display apparatus which is manufactured by using a method of manufacturing an organic light-emitting display apparatus, according to an embodiment of the present invention; and

"FIG. 8 is an expanded view of a portion F of FIG. 7."

For more information, see this patent application: Jung, Suk-Won; Huh, Myung-Soo; Jang, Choel-Min. Vapor Deposition Apparatus, Deposition Method, and Method of Manufacturing Organic Light-Emitting Display Apparatus by Using the Same. Filed July 17, 2013 and posted August 28, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=2692&p=54&f=G&l=50&d=PG01&S1=20140821.PD.&OS=PD/20140821&RS=PD/20140821

Keywords for this news article include: Samsung Display Co., Samsung Display Co. Ltd.

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