Patent number 8814970 is assigned to Canon Kabushiki Kaisha (JP).
The following quote was obtained by the news editors from the background information supplied by the inventors: "The present invention relates to a trapping device that traps a particle in a vacuum atmosphere.
"In order to reduce the size of a pattern of a semiconductor device, an EUV exposure apparatus that exposes a substrate using extreme ultraviolet light (EUV light) as exposure light is developed. With regard to a particle having the size of nanometer order that is generated in the EUV exposure apparatus, its generation cause is not sufficiently resolved, but the operation of the unit along with the slide or the friction maybe the generation cause. Additionally, debris that slightly comes from a light source or the like may be the cause.
"Japanese Patent Laid-Open No. 2002-124463 discloses a physical particle trap in an EUV exposure apparatus. A protect plate that constitutes the particle trap has a groove, and a plurality of protrusions are disposed in the groove. Each protrusion has a barb.
"However, the physical particle trap of Japanese Patent Laid-Open No. 2002-124463 has an extremely complicated structure, and therefore its manufacturing is difficult. Since the structure is complicated, it is also difficult to obtain sufficient cleanliness in a cleaning process after the manufacturing. Accordingly, the particle trap in itself can be a particle generation source."
In addition to the background information obtained for this patent, VerticalNews journalists also obtained the inventor's summary information for this patent: "The present invention provides, for example, a trapping device that has a structure advantageous in terms of manufacturing or cleaning thereof.
"A trapping device as one aspect of the present invention is a trapping device that traps a particle in a vacuum atmosphere. The trapping device includes a plurality of grooves arrayed on a surface of the trapping device. Each of the plurality of grooves has a shape that is obtained by replacing a bottom part of a U-groove is replaced with a V-groove.
"A trapping device as another aspect of the present invention is a trapping device that traps a particle in a vacuum atmosphere. The trapping device includes a plurality of grooves arrayed on a surface of the trapping device . Each of the plurality of grooves has a shape of a regular N-sided pyramid, where N equals 3, 4, or 6.
"A vacuum container as another aspect of the present invention includes the trapping device.
"A processing apparatus as another aspect of the present invention includes the vacuum container, and the processing apparatus is configured to process a substrate in the vacuum container.
"A method of manufacturing a device as another aspect of the present invention includes processing a substrate using the processing apparatus and processing the processed substrate to manufacture the device.
"Further features and aspects of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings."
URL and more information on this patent, see: Yonekawa, Masami. Trapping Device That Traps Particles in Vacuum Atmosphere. U.S. Patent Number 8814970, filed
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