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Study Results from Tel Aviv University Update Understanding of Nanotechnology (Sculpturing the electron wave function using nanoscale phase masks)

August 15, 2014

By a News Reporter-Staff News Editor at Science Letter -- New research on Nanotechnology is the subject of a report. According to news reporting originating from Tel Aviv, Israel, by NewsRx correspondents, research stated, "Electron beams are extensively used in lithography, microscopy, material studies and electronic chip inspection. Today, beams are mainly shaped using magnetic or electric forces, enabling only simple shaping tasks such as focusing or scanning."

Our news editors obtained a quote from the research from Tel Aviv University, "Recently, binary amplitude gratings achieved complex shapes. These, however, generate multiple diffraction orders, hence the desired shape, appearing only in one order, retains little of the beam energy. Here we demonstrate a method in electron-optics for arbitrarily shaping electron beams into a single desired shape, by precise patterning of a thin-membrane. It is conceptually similar to shaping light beams using refractive or diffractive glass elements such as lenses or holograms - rather than applying electromagnetic forces, the beam is controlled by spatially modulating its wavefront. Our method allows for nearly-maximal energy transference to the designed shape, and may avoid physical damage and charging effects that are the scorn of commonly-used (e.g. Zernike and Hilbert) phase-plates. The experimental demonstrations presented here - on-axis HermiteGauss and Laguerre-Gauss (vortex) beams, and computer-generated holograms - are a first example of nearly-arbitrary manipulation of electron beams."

According to the news editors, the research concluded: "Our results herald exciting prospects for microscopic material studies, enables electron lithography with fixed sample and beam and high resolution electronic chip inspection by structured electron illumination."

For more information on this research see: Sculpturing the electron wave function using nanoscale phase masks. Ultramicroscopy, 2014;144():26-31. Ultramicroscopy can be contacted at: Elsevier Science Bv, PO Box 211, 1000 Ae Amsterdam, Netherlands (see also Nanotechnology).

The news editors report that additional information may be obtained by contacting R. Shiloh, Tel Aviv University, Fleischman Fac Engn, Dept. of Phys Elect, IL-6997801 Tel Aviv, Israel. Additional authors for this research include Y. Lereah, Y. Lilach and A. Arie.

Keywords for this news article include: Asia, Israel, Tel Aviv, Nanoscale, Nanotechnology, Emerging Technologies

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Source: Science Letter

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