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Studies from Pohang University of Science and Technology Describe New Findings in Nanotechnology (Nanostructure- and Orientation-Controlled Digital...

August 15, 2014



Studies from Pohang University of Science and Technology Describe New Findings in Nanotechnology (Nanostructure- and Orientation-Controlled Digital Memory Behaviors of Linear-Brush Diblock Copolymers in Nanoscale Thin Films)

By a News Reporter-Staff News Editor at Science Letter -- Data detailed on Nanotechnology have been presented. According to news reporting from Pohang, South Korea, by NewsRx journalists, research stated, "Linear-brush diblock copolymers bearing carbazole moieties in the brush block were synthesized. Various phase-separated nanostructures were found to develop in nanoscale thin films of the copolymers, depending on the fabrication conditions including selective solvent-annealing."

The news correspondents obtained a quote from the research from the Pohang University of Science and Technology, "This variety of morphologies and orientations means that these block copolymers exhibit digital memory versatility in their devices. Overall, the relationship between the morphology and digital memory performance of these copolymers has several important features. In particular, the carbazole moieties in the vertical cylinder phase with a radius of 8 nm or less can trap charges and also form local hopping paths for charge transport, which opens the mass production of advanced digital memory devices with ultrahigh memory density. Charges can be transported through the layer when the dielectric linear block phase has a thickness of 10.6 nm; however, charge transport is not possible for a dielectric phase with a thickness of 15.9 nm."

According to the news reporters, the research concluded: "All the observed memory behaviors are governed by the trap-limited space-charge-limited conduction mechanism and local hopping path (i.e., filament) formation."

For more information on this research see: Nanostructure- and Orientation-Controlled Digital Memory Behaviors of Linear-Brush Diblock Copolymers in Nanoscale Thin Films. Macromolecules, 2014;47(13):4397-4407. Macromolecules can be contacted at: Amer Chemical Soc, 1155 16TH St, NW, Washington, DC 20036, USA. (American Chemical Society - www.acs.org; Macromolecules - www.pubs.acs.org/journal/mamobx)

Our news journalists report that additional information may be obtained by contacting K. Kim, Pohang University of Science & Technology, Pohang Accelerator Lab, Pohang 790784, South Korea. Additional authors for this research include Y.Y. Kim, S. Park, Y.G. Ko, Y. Rho, W. Kwon, T.J. Shin, J. Kim and M. Ree (see also Nanotechnology).

Keywords for this news article include: Asia, Pohang, Nanoscale, South Korea, Nanotechnology, Emerging Technologies

Our reports deliver fact-based news of research and discoveries from around the world. Copyright 2014, NewsRx LLC


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Source: Science Letter


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