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Researchers Submit Patent Application, "Electrostatic Lens and Charged Particle Beam Apparatus Using the Same", for Approval

September 4, 2014



By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventor Noguchi, Yukio (Kyoto-shi, JP), filed on September 27, 2012, was made available online on August 21, 2014.

The patent's assignee is Kyocera Corporation.

News editors obtained the following quote from the background information supplied by the inventors: "Charged particle beam apparatuses are known to include, for example, scanning electron microscopes that emit an electron beam onto a surface of an object such as a semiconductor wafer and a glass substrate and use a generated secondary electron beam, and electron beam lithography apparatuses for forming a fine wiring pattern on an object.

"Japanese Unexamined Patent Application Publication No. 7-161329 discloses an electron beam apparatus which includes an electrostatic lens that allows a single axis electron beam to pass through.

"When a plurality of electrostatic lenses are arranged, for example, in order to improve the throughput of the apparatus, it is difficult to align the plurality of electrostatic lenses since the electrostatic lenses are mechanically positioned. This may lead to variation in the distance between the electron beams which pass through the electrostatic lenses and often generates a non-irradiation area of the electron beam between the irradiation areas. Such a non-irradiation area often causes a non-observation area to be generated in the scanning electron microscope and a failure in wiring pattern to be occurred in the electron beam lithography apparatus.

"Therefore, an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput is needed."

As a supplement to the background information on this patent application, VerticalNews correspondents also obtained the inventor's summary information for this patent application: "The present invention provides an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput and a charged particle beam apparatus which uses the electrostatic lens.

"According to one embodiment of the present invention, an electrostatic lens includes a substrate which includes an insulating plate in which a plurality of through holes that allow an electron beam to pass through are formed, a plurality of electrodes that are formed on an inner wall of the plurality of through holes, and a plurality of wirings that are formed on the insulating plate and are electrically connected to each of the electrodes. The plurality of electrodes are electrically independent from each other.

"According to the electrostatic lens in one embodiment of the present invention, the irradiation accuracy of the electron beam can be increased while improving the throughput.

BRIEF DESCRIPTION OF THE DRAWINGS

"[FIG. 1] FIG. 1(a) is a sectional view of a charged particle beam apparatus in a thickness direction according to one embodiment of the present invention, and FIG. 1(b) is a sectional view of the charged particle beam apparatus of FIG. 1(a) in a plane direction of an electrostatic lens.

"[FIG. 2] FIG. 2 is a perspective view of a stack body of the electrostatic lens shown in FIGS. 1(a) and 1(b) which shows substrates and insulating spacers in a separated state.

"[FIG. 3] FIG. 3(a) is a partial enlarged view of FIG. 1(a), and FIG. 3(b) is a perspective view which shows that part of the frame shown in FIG. 3(a) is reversed.

"[FIG. 4] FIG. 4(a) is a partial enlarged view of the substrate shown in FIG. 2, and FIG. 4(b) is a sectional view which shows a connection structure between the electrostatic lens shown in FIGS. 1(a) and 1(b) and an external circuit in the thickness direction of the electrostatic lens.

"[FIG. 5] FIG. 5 is a sectional view in the plane direction of the electrostatic lens according to another embodiment of the present invention.

"[FIG. 6] FIG. 6 is a partial enlarged view which corresponds to FIG. 4(a) of the electrostatic lens according to another embodiment of the present invention.

"[FIG. 7] FIG. 7(a) is a sectional view in the plane direction of the electrostatic lens according to another embodiment of the present invention, and FIG. 7(b) is a sectional view in the thickness direction of the electrostatic lens shown in FIG. 6(a)."

For additional information on this patent application, see: Noguchi, Yukio. Electrostatic Lens and Charged Particle Beam Apparatus Using the Same. Filed September 27, 2012 and posted August 21, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=5115&p=103&f=G&l=50&d=PG01&S1=20140814.PD.&OS=PD/20140814&RS=PD/20140814

Keywords for this news article include: Nanotechnology, Kyocera Corporation, Emerging Technologies, Electron Beam Lithography.

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Source: Politics & Government Week


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