The patent's assignee is Kabushiki Kaisha Yaskawa Denki.
News editors obtained the following quote from the background information supplied by the inventors: "A known robot conveys a thin sheet-like workpiece such as a semiconductor wafer and a liquid crystal panel (hereinafter referred to as a 'substrate') and a known robot controller controls the robot. Additionally, a known substrate processing apparatus includes a robot that conveys substrates and has therein a locally clean space.
"For example, Patent Literature 1 discloses a robot controller housed under a floor of a clean room in which a robot is disposed, the robot controller having an upper end portion flush with the surface of the floor."
As a supplement to the background information on this patent application, VerticalNews correspondents also obtained the inventor's summary information for this patent application: "Technical Problem
"The related-art robot controller described above is housed under the floor. This presents a problem in that a worker, when attempting to service the robot controller, finds it extremely difficult to do the service job.
"Additionally, the robot controller includes a cooling fan disposed thereinside to exhaust heat generated inside the robot controller. Meanwhile, inside the clean space such as the clean room, air is cleaned by, for example, a downflow.
"This requires that, when the robot controller is to be disposed in the clean room, an airflow through the clean room be prevented from being blocked by the exhaust from the robot controller.
"Solution to Problem
"According to one aspect of embodiments, a substrate processing apparatus includes a housing, a transfer robot and a robot controller. The housing discharges downflow air from a bottom wall side. The transfer robot disposes inside the housing. The transfer robot includes an elevating mechanism that moves vertically within a predetermined vertical moving range an arm section that has a hand capable of holding a conveyed article. The robot controller disposed inside the housing. The robot controller includes a fan disposed on a side surface thereof. The robot controller further includes a cover whose two surfaces are opened, the opened two surfaces being a bottom surface and a side surface that faces the side surface on which the fan is disposed.
BRIEF DESCRIPTION OF DRAWINGS
"A more complete appreciation of the invention and many of the attendant advantages thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
"FIG. 1 is part 1 of a side elevational view illustrating a substrate processing apparatus according to a first embodiment.
"FIG. 2 is a schematic perspective view illustrating a robot controller according to the first embodiment.
"FIG. 3A is a top view illustrating the robot controller according to the first embodiment.
"FIG. 3B is a side elevational view illustrating the robot controller according to the first embodiment.
"FIG. 3C is a front elevational view illustrating the robot controller according to the first embodiment.
"FIG. 4 is part 2 of the side elevational view illustrating the substrate processing apparatus according to the first embodiment.
"FIG. 5 is a schematic perspective view illustrating a robot controller according to a second embodiment.
"FIG. 6A is part 1 of a side elevational view illustrating a substrate processing apparatus according to the second embodiment.
"FIG. 6B is part 2 of the side elevational view illustrating the substrate processing apparatus according to the second embodiment."
For additional information on this patent application, see: KOBUCHI, Shinichi. Substrate Processing Apparatus and Robot Controller. Filed
Keywords for this news article include: Robotics, Machine Learning, Emerging Technologies, Kabushiki Kaisha Yaskawa Denki.
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