Our news editors obtained a quote from the research, "For a given photosintering condition, electrical conductance varied strongly with line widths, ranging from 100 to 300 mu m, illustrating the implications of printing and sintering complex circuit designs with varying feature sizes. By tuning the time delay between printing and sintering, exposure wavelength, radiant energy, pulse width and the distance between the light-source and substrate, photosintering conditions were optimized so that variations in sheet resistance for different line widths were minimized."
According to the news editors, the research concluded: "Using optimized photosintering conditions, a sheet resistance value as low as 150 m Omega/square (resistivity of 9 mu Omega cm) and current carrying capacity of 280 mA for a 300 mu m wide trace was achieved."
For more information on this research see: Photosintering and electrical performance of CuO nanoparticle inks.
The news editors report that additional information may be obtained by contacting
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