Findings from University of California Broaden Understanding of Interface Science (Surface passivation of undoped hematite nanorod arrays via aqueous solution growth for improved photoelectrochemical water splitting)
By a News Reporter-Staff News Editor at Journal of Technology -- Research findings on Interface Science are discussed in a new report. According to news reporting originating in Berkeley, California, by VerticalNews journalists, research stated, "A facile solution-based strategy was found to be effective for surface passivation of undoped hematite nanorod photoanodes by adding noble-metal chlorides such as HAuCl4 and H2PtCl6 in the Fe3+ precursor solution."
The news reporters obtained a quote from the research from the University of California, "XPS and Raman spectra revealed that noble-metal ions would not be doped into, but lead to surface disorder of hematite. Incident photon to current efficiency (IPCE) of the hematite photoanode grown in HAuCl4 and H2PtCl6 contained precursor solution was increased from 3.6% to 11.5% and 12.9%, respectively, at 365 nm and 1.23 v vs. RHE (reversible hydrogen electrode)."
According to the news reporters, the research concluded: "This photoelectrochemical (PEC) enhancement was ascribed to the surface passivation, which resulted in a reduced recombination of photogenerated carriers, as confirmed by ultrafast transient absorption spectroscopy."
For more information on this research see: Surface passivation of undoped hematite nanorod arrays via aqueous solution growth for improved photoelectrochemical water splitting. Journal of Colloid and Interface Science, 2014;427():20-24. Journal of Colloid and Interface Science can be contacted at: Academic Press Inc Elsevier Science, 525 B St, Ste 1900, San Diego, CA 92101-4495, USA. (Elsevier - www.elsevier.com; Journal of Colloid and Interface Science - www.elsevier.com/wps/product/cws_home/622861)
Our news correspondents report that additional information may be obtained by contacting S.H. Shen, University of California, Dept. of Mech Engn, Berkeley, CA 94720, United States. Additional authors for this research include M.T. Li, L.J. Guo, J.G. Jiang and S.S. Mao.
Keywords for this news article include: Berkeley, California, United States, Interface Science, North and Central America
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