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Acquisition of equipment reactive plasma etching

July 28, 2014



Contract notice: Acquisition of equipment reactive plasma etching. This reactor is called a reactive ion etching (RIE) to be used for the etching of layers of oxides, nitrides and semiconductor on planar substrates, with diameters between 10 and 200 mm (8 inches). It will also use 6 reactive gases (alone or mixed). This contract is divided into lots: no Time limit for receipt of tenders or requests to participate: 19.9.2014 - 12:00 Language(s) in which tenders or requests to participate may be drawn up: French.

Major organization : CNRS DÉLÉGATION RHONE AUVERGNE REPRÉSENTÉ PAR M. FRÉDÉRIC FAURE, DÉLÉGUÉ RÉGIONAL

Address : DÉlÉguÉ rÉgional 2 avenue Albert Einstein BP 61335 69609 Villeurbanne For the attention of: Mme Mathilde Zeifman

Country :France

Email : marches@dr7.cnrs.fr

Url : http://www.cnrs.fr

Address : Nstitut de Nanotechnologies de Lyon - UMR 5270 CNRS 36 avenue Guy de Collongue For the attention of: Monsieur Radoslaw Mazurczyk 69134 Ecully Cedex FRANCE Telephone: +33 472186548 E-mail: radoslaw.mazurczyk@ec-lyon.fr

Tender notice number : 254482-2014

Notice type : Tender Notice

Open date : 2014-09-19



Tender documents : T23193067.html


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Source: TendersInfo (India)


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