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Reports Outline Chalcogens Findings from Shenzhen University (Scratch behavior of re-structured carbon coating by oxygen plasma etching technology...

July 29, 2014



Reports Outline Chalcogens Findings from Shenzhen University (Scratch behavior of re-structured carbon coating by oxygen plasma etching technology for magnetic disk application)

By a News Reporter-Staff News Editor at Life Science Weekly -- A new study on Chalcogens is now available. According to news reporting originating from Shenzhen, People's Republic of China, by NewsRx correspondents, research stated, "An oxygen plasma etching technology to prepare ultrathin carbon coatings for magnetic disk in electron cyclotron resonance (ECR) plasma system was developed. In the preparation process, as-deposited carbon coatings were etched by oxygen plasma to obtain re-structured carbon coatings."

Our news editors obtained a quote from the research from Shenzhen University, "Scratch behaviors of the as-deposited and re-structured carbon coatings on silicon substrates were evaluated by atomic force microscope (AFM) scratch test. It was found that the scratch resistance of the re-structured carbon coating was improved. Then X-ray photoelectron spectroscopy (XPS) analysis showed that after oxygen plasma etching, the C=C (sp(2)) content decreased from 55% to 17%, the C - C (sp(3)) content increased from 33% to 58% and the C - O content increased from 7% to 18%. It indicated that the oxygen plasma etching induced the increase of the sp(3) bonding carbon, which contributed to the improved scratch resistance. Further transmission electron microscope (TEM) observation was conducted and the rising of the scratch resistance was inferred to be caused by the formation of the interlayer cross-linking after preferentially breaking the sp(2) bond."

According to the news editors, the research concluded: "Based on the above results, the ultrathin re-structured carbon coatings by oxygen plasma etching were prepared on uncoated magnetic disk substrates and showed a better scratch behavior and a comparable surface roughness in comparison with the commercial magnetic disk."

For more information on this research see: Scratch behavior of re-structured carbon coating by oxygen plasma etching technology for magnetic disk application. Surface & Coatings Technology, 2014;251():128-134. Surface & Coatings Technology can be contacted at: Elsevier Science Sa, PO Box 564, 1001 Lausanne, Switzerland. (Elsevier - www.elsevier.com; Surface & Coatings Technology - www.elsevier.com/wps/product/cws_home/504101)

The news editors report that additional information may be obtained by contacting M.L. Guo, Shenzhen Univ, INSE, Shenzhen 518060, People's Republic of China. Additional authors for this research include D.F. Diao, X. Fan, L. Yang and L.W. Yu (see also Chalcogens).

Keywords for this news article include: Shenzhen, People's Republic of China, Asia, Chalcogens, Emerging Technologies, Nanotechnology, Plasma Etching, Technology

Our reports deliver fact-based news of research and discoveries from around the world. Copyright 2014, NewsRx LLC


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Source: Life Science Weekly


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