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Data on Chalcogens Reported by Researchers at Johns Hopkins University [Electron Induced Surface Reactions of Organometallic Metal(hfac)(2)...

July 22, 2014



Data on Chalcogens Reported by Researchers at Johns Hopkins University [Electron Induced Surface Reactions of Organometallic Metal(hfac)(2) Precursors and Deposit Purification]

By a News Reporter-Staff News Editor at Life Science Weekly -- Researchers detail new data in Chalcogens. According to news reporting originating in Baltimore, Maryland, by NewsRx journalists, research stated, "The elementary processes associated with electron beam-induced deposition (EBID) and post-deposition treatment of structures created from three metal(II)(hfac)(2) organometallic precursors (metal = Pt, Pd, Cu; hfac = CF3C(O)CHC(O)CF3) have been studied using surface analytical techniques. Electron induced reactions of adsorbed metal(II)(hfac)(2) molecules proceeds in two stages."

The news reporters obtained a quote from the research from Johns Hopkins University, "For comparatively low electron doses (doses = 50%) of the oxygen and fluorine atoms, although most (>80%) of the carbon atoms remain. As a result of these various transformations the reduced metal atoms become encased in an organic matrix that is stabilized toward further electron stimulated carbon or oxygen loss, although fluorine and hydrogen can still desorb in the second stage of the reaction under the influence of sustained electron irradiation as a result of C-F and C-H bond cleavage, respectively. This reaction sequence explains why EBID structures created from metal(II)(hfac)(2) precursors in electron microscopes contain reduced metal atoms embedded within an oxygen-containing carbonaceous matrix. Except for the formation of copper fluoride from Cu-II(hfac)(2), because of secondary reactions between partially reduced copper atoms and fluoride ions, the chemical composition of EBID films and behavior of metal(II)(hfac)(2) precursors was independent of the transition metal's chemical identity. Annealing studies of EBID structures created from Pt-II(hfac)(2) suggest that the metallic character of deposited Pt atoms could be increased by using post deposition annealing or elevated substrate temperatures (>25 degrees C) during deposition."

According to the news reporters, the research concluded: "By exposing EBID structures created from Cu-II(hfac)(2) to atomic oxygen followed by atomic hydrogen, organic contaminants could be abated without annealing."

For more information on this research see: Electron Induced Surface Reactions of Organometallic Metal(hfac)(2) Precursors and Deposit Purification. ACS Applied Materials & Interfaces, 2014;6(11):8590-8601. ACS Applied Materials & Interfaces can be contacted at: Amer Chemical Soc, 1155 16TH St, NW, Washington, DC 20036, USA. (American Chemical Society - www.acs.org; ACS Applied Materials & Interfaces - www.pubs.acs.org/journal/aamick)

Our news correspondents report that additional information may be obtained by contacting S.G. Rosenberg, Johns Hopkins University, Dept. of Chem, Baltimore, MD 21218, United States. Additional authors for this research include M. Barclay and D.H. Fairbrother (see also Chalcogens).

Keywords for this news article include: Maryland, Baltimore, Chalcogens, United States, Nanotechnology, Emerging Technologies, Organometallic Organosol, North and Central America

Our reports deliver fact-based news of research and discoveries from around the world. Copyright 2014, NewsRx LLC


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Source: Life Science Weekly


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