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Patent Application Titled "Vapor Deposition Apparatus, Method of Forming Thin Film Using the Same and Method of Manufacturing Organic Light-Emitting...

June 12, 2014



Patent Application Titled "Vapor Deposition Apparatus, Method of Forming Thin Film Using the Same and Method of Manufacturing Organic Light-Emitting Display Apparatus" Published Online

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors KIM, Jin-Kwang (Yongin-City, KR); SONG, Seung-Yong (Yongin-City, KR); HUH, Myung-Soo (Yongin-City, KR); JUNG, Suk-Won (Yongin-City, KR); JANG, Choel-Min (Yongin-City, KR); KIM, Jae-Hyun (Yongin-City, KR); KIM, Sung-Chul (Yongin-City, KR), filed on March 12, 2013, was made available online on May 29, 2014.

No assignee for this patent application has been made.

Reporters obtained the following quote from the background information supplied by the inventors: "Embodiments relate to a vapor deposition apparatus, a method of forming a thin film using the same, and a method of manufacturing an organic light-emitting display apparatus.

"Semiconductor devices, display devices, and other electronic devices may include a plurality of thin films. Various methods may be used to form the plurality of thin films."

In addition to obtaining background information on this patent application, VerticalNews editors also obtained the inventors' summary information for this patent application: "Embodiments are directed to a vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate; and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.

"The vapor deposition apparatus may further include a chamber to accommodate the substrate, the supply unit, and the blocking gas flow generation unit therein.

"The blocking gas flow generation unit may inject towards the supply unit a blocking gas that contains an inert gas.

"The blocking gas flow generation unit may inject towards the supply unit the blocking gas that contains an inert gas when the substrate is not located in a region corresponding to the supply unit.

"The blocking gas flow generation unit may include a plurality of slits to inject the blocking gas.

"The vapor deposition apparatus may further include a driving unit to move the substrate.

"The substrate may be placed on a stage and the driving unit may be connected to the stage to move the stage.

"The driving unit may be disposed to have a reciprocal movement along guide rails.

"The driving unit may include a first supporting member, a second supporting member, and a separation space that is defined as a space between the first supporting member and the second supporting member.

"The first supporting member and the second supporting member may be disposed to reciprocally move along guide rails.

"The blocking gas flow generation unit may be disposed to correspond to the separation space while the driving unit is moving.

"The supply unit may inject the raw material gas towards ground.

"The supply unit may include a first injection unit that injects a first raw material gas, a second injection unit that injects a second raw material gas, and an exhaust unit.

"The first injection unit may inject the first raw material gas in a radical type form to the substrate by generating plasma at a same time as when the first raw material gas is injected.

"Embodiments are also directed to a method of forming a thin film on a substrate using a vapor deposition apparatus, the method including performing a deposition process on the substrate, the deposition process including injecting at least one raw material gas towards the substrate while moving the substrate relative to a supply unit that injects the at least one raw material gas; and blocking a flow of the raw material gas using a gas flow generated by a blocking gas flow generation unit that is disposed corresponding to the supply unit.

"The blocking gas may contain an inert gas, and the blocking gas flow generation unit may inject the blocking gas towards the supply unit when the substrate is not located in a region corresponding to the supply unit.

"Embodiments are also directed to a method of manufacturing an organic light-emitting display apparatus that includes a thin film formed on a substrate, the method including performing a deposition process on the substrate using a vapor deposition apparatus, the deposition process including injecting at least one raw material gas towards the substrate while moving the substrate relative to a supply unit that injects the at least one raw material gas; and blocking a flow of the raw material gas using a gas flow generated by a blocking gas flow generation unit that is disposed corresponding to the supply unit.

"The organic light-emitting display apparatus may include a first electrode, an intermediate layer that includes an organic light-emitting layer, a second electrode, and an encapsulating layer, and the deposition process may form the encapsulating layer.

"The deposition process may form an insulating layer.

"The deposition process may form a conductive film.

BRIEF DESCRIPTION OF THE DRAWINGS

"Features will become apparent to those of skill in the art by describing in detail example embodiments with reference to the attached drawings in which:

"FIG. 1 is schematic drawing of a vapor deposition apparatus according to an embodiment;

"FIG. 2A is a plan view of an upper surface of a blocking gas flow generation unit of FIG. 1, according to an embodiment;

"FIG. 2B is a plan view of an upper surface of a blocking gas flow generation unit of FIG. 1, according to another embodiment;

"FIG. 3 is a schematic perspective view of a vapor deposition apparatus according to another embodiment;

"FIG. 4 is a lateral view of the vapor deposition apparatus of FIG. 3;

"FIG. 5 is a cross-sectional view taken along a line V-V of FIG. 3;

"FIG. 6 is a schematic cross-sectional view of an organic light-emitting display apparatus manufactured using the vapor deposition apparatus according to an embodiment; and

"FIG. 7 is a magnified view of a portion F of FIG. 6."

For more information, see this patent application: KIM, Jin-Kwang; SONG, Seung-Yong; HUH, Myung-Soo; JUNG, Suk-Won; JANG, Choel-Min; KIM, Jae-Hyun; KIM, Sung-Chul. Vapor Deposition Apparatus, Method of Forming Thin Film Using the Same and Method of Manufacturing Organic Light-Emitting Display Apparatus. Filed March 12, 2013 and posted May 29, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=2770&p=56&f=G&l=50&d=PG01&S1=20140522.PD.&OS=PD/20140522&RS=PD/20140522

Keywords for this news article include: Patents.

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Source: Politics & Government Week


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