News Column

Researchers Submit Patent Application, "Mask for Deposition Process", for Approval

July 3, 2014



By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventor KIM, Kyung-Tae (Suwon, KR), filed on October 24, 2013, was made available online on June 19, 2014.

The patent's assignee is Applied Materials, Inc.

News editors obtained the following quote from the background information supplied by the inventors: "Embodiments of the invention relate to a mask for use in a deposition process, such as a chemical vapor deposition (CVD) process used in the manufacture of electronic devices. In particular, embodiments of the invention relate to a mask utilized in an encapsulation process in the manufacture of organic light emitting diode (OLED) display devices.

"OLEDs are used in the manufacture of television screens, computer monitors, mobile phones, other hand-held devices, etc. for displaying information. A typical OLED may include layers of organic material situated between two electrodes that are all deposited on a substrate in a manner to form a matrix display panel having individually energizable pixels. The OLED is generally placed between two glass panels, and the edges of the glass panels are sealed to encapsulate the OLED therein.

"There are many challenges encountered in the manufacture of such display devices. In some fabrication steps, the OLED material is encapsulated in one or more layers to prevent moisture from damaging the OLED material. During these processes, one or more masks are utilized to shield portions of the substrate that do not include the OLED material. The masks used in these processes must endure significant temperature differences. The temperature extremes cause thermal expansion and contraction of the mask, which may lead to cracks, bending or breakage of the mask, any one of which may cause contamination of portions of the substrate. Additionally, significant electrostatic discharge (ESD) may be present and/or created during these deposition processes. Uncontrolled ESD may damage the OLED material.

"Therefore, there is a continuous need for new and improved apparatus and processing methods using masks in forming OLED display devices."

As a supplement to the background information on this patent application, VerticalNews correspondents also obtained the inventor's summary information for this patent application: "Embodiments of the invention provide a mask and a process kit for use in a deposition process. In one embodiment, a mask for use in a deposition process is provided The mask comprises a rectangular frame member having two opposing major sides and two opposing minor sides, each of the major and minor sides comprising a first side, a second side opposing the first side and joined to the first side by a first outer sidewall, a second outer sidewall disposed inward of the first outer sidewall and defining a raised region projecting from a plane of the second side, and an interior sidewall joining the raised region and the first side. The mask also comprises a rectangular strip disposed on a surface of the raised region, the rectangular strip comprising a first end, and a second end coupled to the first end and extending into an interior area of the frame member.

"In another embodiment, a mask for a deposition process is provided. The mask comprises a rectangular frame member having two opposing major sides and two opposing minor sides. Each of the major and minor sides comprise a first side, a second side opposing the first side and joined to the first side by a first outer sidewall, a second outer sidewall disposed inward of the first outer sidewall and defining a raised region projecting from a plane of the second side, and an interior sidewall joining the raised region and the first side. The mask also comprises a rectangular strip disposed on a surface of the raised region, the rectangular strip coupled to the frame member by a fastener assembly and circumscribing an interior surface of the frame member. The rectangular strip comprises a first end, and a second end coupled to the first end and extending past the interior sidewall into an interior area of the frame member.

"In another embodiment, a process kit for use in a deposition chamber is provided. The process kit comprises a shadow frame, and a mask. The mask comprises a rectangular frame member having two opposing major sides and two opposing minor sides, each of the major and minor sides comprising a first side, a second side opposing the first side and joined to the first side by a first outer sidewall, a second outer sidewall disposed inward of the first outer sidewall and defining a raised region projecting from a plane of the second side, and an interior sidewall joining the raised region and the first side. The mask also comprises a rectangular strip disposed on a surface of the raised region, the rectangular strip comprising a first end, and a second end coupled to the first end and extending into an interior area of the frame member.

BRIEF DESCRIPTION OF THE DRAWINGS

"So that the manner in which the above recited features can be understood in detail, a more particular description of embodiments of the invention, briefly summarized above, may be had by reference to the embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.

"FIG. 1 is a schematic cross-sectional view of a CVD apparatus according to one embodiment.

"FIG. 2 is an exploded isometric view of interior chamber components used in the chamber body of the apparatus of FIG. 1.

"FIG. 3A is a side cross-sectional view of the substrate support of FIG. 1 having the substrate thereon in a processing position.

"FIG. 3B is an enlarged cross-sectional view of a portion of the frame of the mask of FIG. 3A.

"FIG. 4A is an isometric view of one embodiment of a mask that may be used in the apparatus of FIG. 1.

"FIG. 4B is a schematic top view showing one embodiment of a strip assembly that may be used with embodiments of the mask as described herein.

"FIG. 5 is an isometric view of another embodiment of a mask that may be used in the apparatus of FIG. 1.

"To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. It is contemplated that elements disclosed in one embodiment may be beneficially utilized on other embodiments without specific recitation."

For additional information on this patent application, see: KIM, Kyung-Tae. Mask for Deposition Process. Filed October 24, 2013 and posted June 19, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=7204&p=145&f=G&l=50&d=PG01&S1=20140612.PD.&OS=PD/20140612&RS=PD/20140612

Keywords for this news article include: Applied Materials Inc.

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Source: Politics & Government Week


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