News Column

Researchers Submit Patent Application, "Anti-Glare Using a Two-Step Texturing Process", for Approval

July 3, 2014



By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors Kalyankar, Nikhil (Mountain View, CA); Jewhurst, Scott (Redwood City, CA); Le, Minh Huu (San Jose, CA), filed on December 12, 2012, was made available online on June 19, 2014.

The patent's assignee is Intermolecular, Inc.

News editors obtained the following quote from the background information supplied by the inventors: "Anti-glare coatings, and anti-glare panels in general, are desirable in many applications including semiconductor device manufacturing, solar cell manufacturing, glass manufacturing, and display screen manufacturing. Such optical coatings scatter specular reflections into a wide viewing cone to diffuse glare and reflection. It is difficult to achieve a substrate that simultaneously reduces gloss (i.e., specular reflection) and haze (i.e., diffuse transmittance) while relying on light scattering to obtain anti-glare properties.

"Conventional methods of forming anti-glare panels include, for example, wet etching the surface of the substrate, using mechanical rollers with pre-defined textures on substrates to create a surface roughness, and applying thin, polymeric films with texture to the substrates using adhesives. Such methods are expensive, have low throughput (i.e., a low rate of manufacture), and lack precise control with respect to surface texture, which results in a diffuse scattering coating with poor light transmittance. Additionally, coatings formed using the polymeric films often demonstrate poor abrasion resistance and cohesive strength, resulting in the coatings (and/or the substrate itself) being damaged when various forces are experienced."

As a supplement to the background information on this patent application, VerticalNews correspondents also obtained the inventors' summary information for this patent application: "The following summary of the disclosure is included in order to provide a basic understanding of some aspects and features of the invention. This summary is not an extensive overview of the invention and as such it is not intended to particularly identify key or critical elements of the invention or to delineate the scope of the invention. Its sole purpose is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented below.

"In some embodiments, methods for forming anti-glare coatings including forming a layer using a sol-gel process are described. The layer further includes at least one of porogens, nanoparticles, or photosensitive macromolecules. The porogens, nanoparticles, or photosensitive macromolecules are removed using a thermal treatment or UV treatment to impart porosity and surface roughness to the layer. Alternatively, the layer may be roughened using a mechanical process. The layer can optionally be subjected to a curing step. The curing step may be a thermal curing process or a chemical curing process.

BRIEF DESCRIPTION OF THE DRAWINGS

"To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The drawings are not to scale and the relative dimensions of various elements in the drawings are depicted schematically and not necessarily to scale.

"The techniques of the present invention can readily be understood by considering the following detailed description in conjunction with the accompanying drawings, in which:

"FIG. 1 illustrates a flow chart describing methods of some embodiments.

"FIG. 2 illustrates a cross-sectional schematic of a substrate with a layer formed thereon.

"FIG. 3 illustrates a cross-sectional schematic of a substrate with a layer formed thereon.

"FIG. 4 illustrates a cross-sectional schematic of a substrate with a layer formed thereon."

For additional information on this patent application, see: Kalyankar, Nikhil; Jewhurst, Scott; Le, Minh Huu. Anti-Glare Using a Two-Step Texturing Process. Filed December 12, 2012 and posted June 19, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=3262&p=66&f=G&l=50&d=PG01&S1=20140612.PD.&OS=PD/20140612&RS=PD/20140612

Keywords for this news article include: Nanoparticle, Nanotechnology, Intermolecular Inc., Emerging Technologies.

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Source: Politics & Government Week


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