The assignee for this patent application is
Reporters obtained the following quote from the background information supplied by the inventors: "Anti-glare coatings, and anti-glare panels in general, are desirable in many applications including semiconductor device manufacturing, solar cell manufacturing, glass manufacturing, and display screen manufacturing. Such optical coatings scatter specular reflections into a wide viewing cone to diffuse glare and reflection. It is difficult to achieve a substrate that simultaneously reduces gloss (i.e., specular reflection) and haze (i.e., diffuse transmittance) while relying on light scattering to obtain anti-glare properties.
"Conventional methods of forming anti-glare panels include, for example, wet etching the surface of the substrate, using mechanical rollers with pre-defined textures on substrates to create a surface roughness, and applying thin, polymeric films with texture to the substrates using adhesives. Such methods are expensive, have low throughput (i.e., a low rate of manufacture), and lack precise control with respect to surface texture, which results in a diffuse scattering coating with poor light transmittance. Additionally, coatings formed using the polymeric films often demonstrate poor abrasion resistance and cohesive strength, resulting in the coatings (and/or the substrate itself) being damaged when various forces are experienced."
In addition to obtaining background information on this patent application, VerticalNews editors also obtained the inventors' summary information for this patent application: "The following summary of the disclosure is included in order to provide a basic understanding of some aspects and features of the invention. This summary is not an extensive overview of the invention and as such it is not intended to particularly identify key or critical elements of the invention or to delineate the scope of the invention. Its sole purpose is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented below.
"In some embodiments, methods for depositing layers by PVD, wherein the PVD process parameters are selected to impart porosity in the layer are described. The porous layers are then exposed to a vapor or liquid binder material to fill the pores and increase the mechanical strength of the layer and the adhesion of the layer. Optionally, a curing step may be applied to the layer. Methods for depositing polycrystalline metal oxide layers using PVD or CVD are described. Optionally, the layers are exposed to an anneal step. The polycrystalline metal oxide layers are then exposed to a vapor or liquid texturing reagent to texture the surface of the layer.
BRIEF DESCRIPTION OF THE DRAWINGS
"To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The drawings are not to scale and the relative dimensions of various elements in the drawings are depicted schematically and not necessarily to scale.
"The techniques of the present invention can readily be understood by considering the following detailed description in conjunction with the accompanying drawings, in which:
"FIG. 1 illustrates a cross-sectional schematic of a substrate with a porous film formed thereon.
"FIG. 2 illustrates a cross-sectional schematic of a substrate with a porous film formed thereon.
"FIG. 3 illustrates a cross-sectional schematic of a substrate with a porous film formed thereon.
"FIGS. 4A and 4B illustrate a cross-sectional schematic of a substrate with a polycrystalline film formed thereon.
"FIGS. 5A and 5B illustrate a cross-sectional schematic of a substrate with a polycrystalline film formed thereon.
"FIGS. 6A and 6B illustrate a cross-sectional schematic of a substrate with a polycrystalline film formed thereon.
"FIGS. 7A and 7B illustrate a PVD system according to some embodiments.
"FIG. 8 illustrates an in-line PVD system according to some embodiments.
"FIG. 9 illustrates a flow chart describing methods according to some embodiments.
"FIG. 10 illustrates a flow chart describing methods according to some embodiments."
For more information, see this patent application: Kalyankar, Nikhil; Jewhurst, Scott; Le,
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