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New Findings from University of Science and Technology in the Area of Applied Surface Science Reported [Interaction of tetraethoxysilane with...

July 4, 2014



New Findings from University of Science and Technology in the Area of Applied Surface Science Reported [Interaction of tetraethoxysilane with OH-terminated SiO2 (001) surface: A first principles study]

By a News Reporter-Staff News Editor at Science Letter -- Data detailed on Science have been presented. According to news reporting out of Beijing, People's Republic of China, by NewsRx editors, research stated, "First principles calculates have been performed to investigate the surface reaction mechanism of tetraethoxysilane (TEOS) with fully hydroxylated SiO2(0 01) substrate. In semiconductor industry, this is the key step to understand and control the SiO2 film growth in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes."

Our news journalists obtained a quote from the research from the University of Science and Technology, "During the calculation, we proposed a model which breaks the surface dissociative chemisorption into two steps and we calculated the activation barriers and thermochemical energies for each step. Our calculation result for step one shows that the first half reaction is thermodynamically favorable. For the second half reaction, we systematically studied the two potential reaction pathways."

According to the news editors, the research concluded: "The comparing result indicates that the pathway which is more energetically favorable will lead to formation of crystalline SiO2 films while the other will lead to formation of disordered SiO2 films."

For more information on this research see: Interaction of tetraethoxysilane with OH-terminated SiO2 (001) surface: A first principles study. Applied Surface Science, 2014;305():247-251. Applied Surface Science can be contacted at: Elsevier Science Bv, PO Box 211, 1000 Ae Amsterdam, Netherlands. (Elsevier - www.elsevier.com; Applied Surface Science - www.elsevier.com/wps/product/cws_home/505669)

Our news journalists report that additional information may be obtained by contacting X.D. Deng, Univ Sci & Technol Beijing, Inst Appl Phys, Beijing 100083, People's Republic of China. Additional authors for this research include Y.X. Song, J.C. Li and Y.K. Pu (see also Science).

Keywords for this news article include: Asia, Beijing, Science, People's Republic of China

Our reports deliver fact-based news of research and discoveries from around the world. Copyright 2014, NewsRx LLC


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Source: Science Letter


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