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Patent Issued for Regenerative Amplifier, Laser Apparatus, and Extreme Ultraviolet Light Generation System

June 25, 2014



By a News Reporter-Staff News Editor at Electronics Newsweekly -- According to news reporting originating from Alexandria, Virginia, by VerticalNews journalists, a patent by the inventors Nowak, Krzysztof (Oyama, JP); Suganuma, Takashi (Oyama, JP); Wakabayashi, Osamu (Hiratsuka, JP), filed on March 7, 2011, was published online on June 10, 2014.

The assignee for this patent, patent number 8749876, is Gigaphoton Inc. (Tochigi, JP).

Reporters obtained the following quote from the background information supplied by the inventors: "This disclosure relates to a regenerative amplifier, a laser apparatus, and an extreme ultraviolet light generation system.

"With recent increase in integration of semiconductor devices, transfer patterns for use in photolithography of a semiconductor process have rapidly become finer. In the next generation, microfabrication at 70 to 45 nm, further, microfabrication at 32 nm or less is to be demanded. Accordingly, for example, to meet the demand for microfabrication at 32 nm or less, an exposure apparatus is expected to be developed, where an extreme ultraviolet (EUV) light generation system generating EUV light of a wavelength of approximately 13 nm is combined with a reduction projection reflective optical system.

"There are mainly three types of EUV light generation systems, namely, a laser produced plasma (LPP) type system using plasma produced by applying a laser beam onto a target, a discharge produced plasma (DPP) type system using plasma produced by discharge, and a synchrotron radiation type system using orbital radiation."

In addition to obtaining background information on this patent, VerticalNews editors also obtained the inventors' summary information for this patent: "A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

"A laser apparatus according to another aspect of this disclosure may include: at least one semiconductor laser oscillating a laser beam with a predetermined wavelength; and a regenerative amplifier including a pair of resonator mirrors constituting an optical resonator, an input coupling unit provided between the pair of the resonator mirrors for introducing the laser beam into the optical resonator, a slab amplifier provided between the pair of the resonator mirrors for amplifying the laser beam with the predetermined wavelength, an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position, and an output coupling unit for outputting the laser beam amplified by the slab amplifier to an exterior of the optical resonator.

"An extreme ultraviolet light generation system according to yet another aspect of this disclosure may include: at least one semiconductor laser oscillating a laser beam with a predetermined wavelength; a regenerative amplifier including a pair of resonator mirrors constituting an optical resonator, an input coupling unit provided between the pair of the resonator mirrors for introducing the laser beam into the optical resonator, a slab amplifier provided between the pair of the resonator mirrors for amplifying the laser beam with the predetermined wavelength, an optical system disposed to form a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position, and an output coupling unit for outputting the laser beam amplified by the slab amplifier to an exterior of the optical resonator; at least one amplifier for amplifying the laser beam outputted from the regenerative amplifier; a chamber provided with an input port through which the laser beam enters the chamber; a target supply unit provided to the chamber for supplying, to a predetermined region inside the chamber, a target substance serving as a plasma source; a focusing mirror for focusing the laser beam amplified by the at least one amplifier at a point in the predetermined region; and a collector mirror provided in the chamber for collecting the extreme ultraviolet light emitted from the plasma generated in the predetermined region.

"These and other objects, features, aspects, and advantages of this disclosure will become apparent to those skilled in the art from the following detailed description, which, taken in conjunction with the annexed drawings, discloses preferred embodiments of this disclosure."

For more information, see this patent: Nowak, Krzysztof; Suganuma, Takashi; Wakabayashi, Osamu. Regenerative Amplifier, Laser Apparatus, and Extreme Ultraviolet Light Generation System. U.S. Patent Number 8749876, filed March 7, 2011, and published online on June 10, 2014. Patent URL: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=8749876.PN.&OS=PN/8749876RS=PN/8749876

Keywords for this news article include: Electronics, Semiconductor, Gigaphoton Inc..

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Source: Electronics Newsweekly


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