News Column

"Display Apparatus and Method of Manufacturing Display Apparatus" in Patent Application Approval Process

June 26, 2014



By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventor KAWACHI, Genshiro (Osaka, JP), filed on November 28, 2013, was made available online on June 12, 2014, according to news reporting originating from Washington, D.C., by VerticalNews correspondents.

This patent application is assigned to Panasonic Liquid Crystal Display Co., Ltd.

The following quote was obtained by the news editors from the background information supplied by the inventors: "The present invention relates to a display apparatus and a method of manufacturing a display apparatus.

"A display apparatus, which includes a thin film transistor (TFT) using a semiconductor oxide in a semiconductor layer, is known. In the display apparatus, the TFT is formed by sequentially stacking a gate insulating film, a semiconductor oxide layer, a channel protection film, and source/drain electrodes on a gate electrode that is formed as a portion of a gate line. Note that the source/drain electrodes are formed of the same metal layer, and are respectively connected to the semiconductor oxide layer through contact holes formed at the channel protection film (see JP Patent No. 4982619)."

In addition to the background information obtained for this patent application, VerticalNews journalists also obtained the inventor's summary information for this patent application: "Recently, a definition of a liquid crystal display apparatuses has become higher. However, for example, the presence of a source electrode for connecting a TFT and a pixel electrode may restrict the high definition of liquid crystal display apparatuses. Specifically, for example, since a predetermined area is required to form a contact hole for connecting a source electrode and a semiconductor layer, an aperture ratio of a pixel is reduced, thus increasing the power consumption of the entire display apparatus. Also, it is difficult to dispose a source electrode while keeping a predetermined distance between two adjacent signal lines. As a result it is impossible to reduce a pixel size.

"In view of the above problem, an object of one or more embodiments of the present invention is to provide a display apparatus and a method of manufacturing a display apparatus, which can promote higher definition.

"(1) In one or more embodiments of the present invention, a display apparatus includes a gate electrode formed on a substrate as a portion of a gate line, a gate insulating film formed on the gate electrode, a semiconductor oxide layer formed on the gate insulating film, and a first insulating film formed to cover the semiconductor oxide layer. The display apparatus also includes a drain electrode connected to the semiconductor oxide layer through a first contact hole that is formed at the first insulating film, a second insulating film formed on the first insulating film, a third insulating film formed on the second insulating film, and a pixel electrode formed on the third insulating film. The pixel electrode is connected to the semiconductor oxide layer through a second contact hole that is formed on the semiconductor oxide layer.

"(2) In the display apparatus according to (1), the display apparatus further includes a common electrode between the second insulating film and the third insulating film, in a region facing the pixel electrode.

"(3) In the display apparatus according to (2), the common electrode covers a drain line comprising the drain electrode, through the second insulating film.

"(4) In the display apparatus according to (1), the second contact hole is formed at the first to third insulating films.

"(5) In the display apparatus according to (1), the second insulating film is an organic protection film.

"(6) In the display apparatus according to (1), the second contact hole is formed outside the gate electrode in a cross-sectional view.

"(7) In the display apparatus according to (2), the display apparatus further includes a common signal line in a portion between the substrate and the gate insulating film. The common signal line is connected to the common electrode through a third contact hole.

"(8) In the display apparatus according to (1), the display apparatus further includes a common electrode facing the pixel electrode, between the substrate and the gate insulating film.

"(9) In the display apparatus according to (8), the display apparatus further includes a common signal line in a portion between the gate insulating film and the common electrode.

"(10) In the display apparatus according to one of (7) to (9), the common signal line is disposed in a direction along the gate line.

"(11) In one or more embodiments of the present invention, a method of manufacturing a display apparatus includes forming a gate electrode on a substrate as a portion of a gate line, forming a gate insulating film on the gate electrode, forming a semiconductor oxide layer on the gate insulating film, forming a first insulating film so as to cover the semiconductor oxide layer, forming a first contact hole at the first insulating film, forming an electrode connected to the semiconductor oxide layer through the first contact hole, forming a second insulating film on the first insulating film, forming a third insulating film on the second insulating film, forming a second contact hole on the semiconductor oxide layer, and forming a pixel electrode on the third insulating film. The pixel electrode is connected to the semiconductor oxide layer through the second contact hole.

"(12) The display apparatus according to claim 1, wherein said gate electrode is in direct contact with said substrate.

"(13) The display apparatus according to claim 12, wherein said gate insulating film is in direct contact with said gate electrode.

"(14) The display apparatus according to claim 13, wherein said semiconductor oxide layer is in direct contact with said gate insulating film.

"(15) The display apparatus according to claim 14, wherein said first insulating film is in direct contact with said semiconductor oxide layer.

"(16) The display apparatus according to claim 15, wherein said second insulating film is in direct contact with said first insulating film.

"(17) The display apparatus according to claim 16, wherein said pixel electrode is in direct contact with said third insulating film.

BRIEF DESCRIPTION OF THE DRAWINGS

"FIG. 1 is a schematic diagram illustrating a display apparatus according to an embodiment of the present invention;

"FIG. 2 is a conceptual diagram illustrating a pixel circuit formed on a TFT substrate illustrated in FIG. 1;

"FIG. 3 is a diagram illustrating an example of a configuration of a pixel illustrated in FIG. 2;

"FIG. 4 is a diagram illustrating a schematic example of a IV-IV section of FIG. 3;

"FIG. 5 is a diagram illustrating a schematic example of a V-V section of FIG. 3;

"FIG. 6A is a schematic diagram illustrating a method of manufacturing a TFT substrate 102 illustrated in FIG. 1;

"FIG. 6B is a schematic diagram illustrating a method of manufacturing a TFT substrate 102 illustrated in FIG. 1;

"FIG. 6C is a schematic diagram illustrating a method of manufacturing a TFT substrate 102 illustrated in FIG. 1;

"FIG. 6D is a schematic diagram illustrating a method of manufacturing a TFT substrate 102 illustrated in FIG. 1;

"FIG. 7 is a diagram illustrating an example of a configuration of a pixel according to Modification 1;

"FIG. 8 is a diagram illustrating a schematic example of a VIII-VIII section of FIG. 7;

"FIG. 9 is a diagram illustrating a schematic example of a IX-IX section of FIG. 7;

"FIG. 10 is a diagram illustrating an example of a configuration of a pixel according to Modification 2;

"FIG. 11 is a diagram illustrating a schematic example of a XI-XI section of FIG. 10;

"FIG. 12 is a diagram illustrating a schematic example of a XII-XII section of FIG. 10;

"FIG. 13 is a diagram illustrating an example of a configuration of a pixel according to Modification 3;

"FIG. 14 is a diagram illustrating a schematic example of a XIV-XIV section of FIG. 13; and

"FIG. 15 is a diagram illustrating a schematic example of a XV-XV section of FIG. 13."

URL and more information on this patent application, see: KAWACHI, Genshiro. Display Apparatus and Method of Manufacturing Display Apparatus. Filed November 28, 2013 and posted June 12, 2014. Patent URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&u=%2Fnetahtml%2FPTO%2Fsearch-adv.html&r=5783&p=116&f=G&l=50&d=PG01&S1=20140605.PD.&OS=PD/20140605&RS=PD/20140605

Keywords for this news article include: Electronics, Semiconductor, Panasonic Liquid Crystal Display Co. Ltd..

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Source: Politics & Government Week


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