News Column

Denton Vacuum Releases Exilis 1

May 8, 2014

Denton Vacuum, a manufacturer of thin film technology products, announced the introduction of Exilis 1, a new atomic layer deposition system that will deliver results for users in the research, aerospace, optics, semiconductor and medical communities.

"We've talked to ALD system users all over the world, and they are not happy with what's now available on the market," said Vince McGinty, president and CEO of Denton Vacuum. "Many commercially available ALD systems are limited in capability, while others have proven to be maintenance nightmares, with such simple tasks as chamber cleaning, precursor loading and valve changes turning into complex events that lead to extended, even indeterminate downtime. "Adding to this," McGinty continued, "users in the corporate community often find that systems designed for research and development bear no resemblance to systems designed for manufacturing-scale activities. Exilis 1 addresses these issues, with broader capability, improved productivity and maintainability, and direct paths to production scale-up."

According to a release, Denton Vacuum's Exilis 1 brings new capability in several key areas, including:

-Multi-wafer and 3D component capability

-Expanded process chamber adaptability

-An automated load/unload arm that enables immediate, safe removal of hot substrates from the process chamber

-Reliable and quick replacement of precursor canisters and ALD valves

More information:

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Source: Travel & Leisure Close - Up

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