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Researchers from Tohoku University Report Details of New Studies and Findings in the Area of Thin Solid Films

May 27, 2014

By a News Reporter-Staff News Editor at Journal of Technology -- Investigators discuss new findings in Thin Solid Films. According to news reporting originating in Miyagi, Japan, by VerticalNews journalists, research stated, "We demonstrate that maskless wet etching of self-assembled Ge quantum dot (QD) multilayers can create large-area photonic nanostructures, and the geometry can be tuned by changing wet etching conditions."

The news reporters obtained a quote from the research from Tohoku University, "It is found that the reflectance in the near-infrared wave length can be decreased by controlling geometry, and an increase in the depth of the photonic nanostructures results in enhancement of photoluminescence intensity from Ge QDs."

According to the news reporters, the research concluded: "These results show that control of geometry in photonic nanostructures is useful for enhancement of optical absorption in the Ge QD multilayers."

For more information on this research see: Control of geometry in Si-based photonic nanostructures formed by maskless wet etching process and its impact on optical properties. Thin Solid Films, 2014;557():338-341. Thin Solid Films can be contacted at: Elsevier Science Sa, PO Box 564, 1001 Lausanne, Switzerland. (Elsevier -; Thin Solid Films -

Our news correspondents report that additional information may be obtained by contacting Y. Hoshi, Tohoku University, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan. Additional authors for this research include T. Tayagaki, T. Kiguchi and N. Usami.

Keywords for this news article include: Asia, Japan, Miyagi, Thin Solid Films

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Source: Journal of Technology

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