The patent's assignee for patent number 8723134 is ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH (Heimstetten, DE).
News editors obtained the following quote from the background information supplied by the inventors: "Charged particle beam apparatuses have many functions in a plurality of industrial fields, including, but not limited to, inspection of semiconductor devices during manufacturing, exposure systems for lithography, detecting devices and testing systems. Thus, there is a high demand for structuring and inspecting specimen within the micrometer and nanometer scale.
"Charged particle beam devices such as ion beam devices, electron beam devices and the like, have experienced an increasing demand throughout the recent years. Due to their application for inspection services, the requirements for the charged particle beam devices have also increased with regard to their construction and performance, e.g. for use in production lines.
"Modern charged particle beam devices, particularly those for inspection applications, testing applications, lithography applications and the like, but also those for analyzing applications, are therefore often miniaturized, using inter alia mini-lenses to decrease the device size. Further, there is a desire to reduce the optical path of a charged particle beam device for devices which would not be considered as being miniaturized per se.
"In order to improve the function of a miniaturized lens in a charged particle beam device, a tool is provided that utilizes a miniaturized construction and allows the correction of the spherical aberrations within a charged particle beam device."
As a supplement to the background information on this patent, VerticalNews correspondents also obtained the inventor's summary information for this patent: "In light of the above, a correction device according to independent claim 1, a charged particle beam device according to claim 10 and a method of correcting an aberration according to independent claim 13 are provided.
"According to one embodiment, a correction device for a charged particle beam device is provided for correcting aberrations of a charged particle beam. The correction device includes a stack of plates arranged along an optical axis of the charged particle beam device. The stack of plates includes at least a first and a second multipole plate assembly, wherein the first and the second multipole plate assembly each includes at least a first multipole plate with an n-fold symmetry aperture arrangement, wherein the number of poles of the multipole of the multipole plate is 2n and the multipole plates are adapted to be biased to one potential respectively.
"According to a further embodiment, a method of correcting an aberration of a charged particle beam in a charged particle beam device is provided. The charged particle beam device has an optical axis and stack of plates, with an electrostatic multipole corrector. The method includes providing at least a first and a second multipole plate assembly, which includes each at least one multipole plate arranged along the optical axis and thereby, forming the stack of plates; generating a multipole by the multipole plate of the first multipole plate assembly and generating a multipole by the multipole plate of the second multipole plate assembly, wherein the multipoles are generated by biasing the multipole plates to a single potential respectively.
"Further advantages, features, aspects and details, which can be combined with embodiments described herein, are evident from the dependent claims, the description and the drawings.
"Embodiments are also directed to apparatuses for carrying out the disclosed methods and including apparatus parts for performing each described method step. These method steps may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments according to the invention are also directed to methods by which the described apparatus operates. It includes method steps for carrying out every function of the apparatus."
For additional information on this patent, see: Janzen, Roland. Electrostatic Corrector. U.S. Patent Number 8723134, filed
Keywords for this news article include: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH.
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