The assignee for this patent application is Canon Kabushiki Kaisha.
Reporters obtained the following quote from the background information supplied by the inventors: "The present invention relates to a holding apparatus, a lithography apparatus, and a method of manufacturing an article.
"In an EUV (Extreme Ultraviolet) exposure apparatus which has been developed as a next-generation semiconductor manufacturing apparatus or a drawing apparatus using a charged particle beam (electron beam), a substrate is exposed in a vacuum atmosphere. In a vacuum atmosphere, the heat is not transferred by convection, and thus tends to accumulate in an object. For the EUV exposure apparatus or drawing apparatus, a measure against heat (cooling of an object) is one of important development elements.
"To cool a substrate to be processed by the EUV exposure apparatus or drawing apparatus, for example, a technique of sealing a gas between the substrate and a holding portion (a chuck or the like) for holding the substrate to accelerate heat transfer from the substrate to the holding portion is used. In recent years, it has been required to further accelerate heat transfer to improve a resolution or overlay accuracy. International Patent Publication No.2009/011574 proposes a holding apparatus for holding a substrate by sealing a liquid between the substrate and a holding portion. This holding apparatus holds the substrate by the holding portion using the fact that the layer of the liquid is set at a negative pressure with respect to a vacuum atmosphere.
"The holding portion preferably has an increased heat capacity to reduce a change in temperature but it is not preferable to increase the volume (size) of the holding portion. To cope with this, Japanese Patent Laid-Open No. 2009-545157 proposes a holding apparatus using a latent heat storage member, the phase of which changes. This holding apparatus increases a heat amount (heat transfer amount) transferred from a substrate to the latent heat storage member by a heat storage structure including a high heat conducting member and the latent heat storage member.
"In the conventional technique, however, it is not always possible to obtain a sufficient heat transfer amount for the resolution or overlay accuracy recently required. Especially in the EUV exposure apparatus or drawing apparatus, the substrate is irradiated with high-energy EUV light or charged particle beam, and thus the heat amount that accumulates in the substrate increases, thereby worsening the problem associated with the heat transfer amount."
In addition to obtaining background information on this patent application, VerticalNews editors also obtained the inventors' summary information for this patent application: "The present invention provides, for example, a holding apparatus advantageous to transfer of heat from a substrate.
"According to one aspect of the present invention, there is provided a holding apparatus which includes a base having, on a surface thereof, a convex portion for supporting a back surface of a substrate and a containing portion for containing a liquid, and supports the substrate via the convex portion and the liquid, the apparatus including a heat storage structure including a latent heat storage member configured to store heat transferred from the substrate, and arranged in the containing portion, and a member configured to exert, to the heat storage structure, a force in a first direction from the base to the substrate.
"Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
"FIG. 1 is a schematic view showing the arrangement of a lithography apparatus according to an aspect of the present invention.
"FIGS. 2A and 2B are schematic views showing the arrangement of a holding apparatus in the lithography apparatus shown in FIG. 1.
"FIG. 3 is a schematic view showing another arrangement of the heat storage structure of the holding apparatus in the lithography apparatus shown in FIG. 1."
For more information, see this patent application: Morohashi, Akira; Maehara, Yuji. Holding Apparatus, Lithography Apparatus, and Method of Manufacturing Article. Filed
Keywords for this news article include: Canon Kabushiki Kaisha.
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