The patent's assignee is
News editors obtained the following quote from the background information supplied by the inventors: "Contemporary advances in nanotechnology have allowed several types of nano materials to become widely available for use in many different industries. The ability to measure and manipulate materials on a nanometer level now makes it possible to recognize new nano materials with enhanced properties and to thus broaden the application area of nano structures (e.g., nano wires) made with nano materials.
As a supplement to the background information on this patent application, VerticalNews correspondents also obtained the inventor's summary information for this patent application: "Techniques for forming a nano pattern on a substrate are provided. In one embodiment, a method for forming a nano pattern on a substrate includes coating a part of a structural guide with a hydrophobic polymer, positioning the structural guide on a substrate, coating at least a part of the substrate with a film made of a block copolymer, and annealing the film made of the block copolymer to align the block copolymer.
"The foregoing summary is illustrative only and is not intended to be in any way limiting. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features will become apparent by reference to the drawings and the following detailed description.
BRIEF DESCRIPTION OF THE FIGURES
"FIG. 1 is a schematic diagram of an illustrative embodiment of a nano pattern forming device.
"FIG. 2 shows an illustrative embodiment of a structural guide of FIG. 1 having a nano frame in the structural guide.
"FIG. 3 shows an illustrative embodiment of the structural guide of FIG. 1 having a protruded nano beam in the structural guide.
"FIG. 4 shows a perspective view of the structural guide with the nano frame of FIG. 2 positioned on a substrate.
"FIG. 5 shows a perspective view of the structural guide with the protruded nano beam of FIG. 3 positioned on a substrate.
"FIG. 6 shows a perspective view of a film of the block co-polymer aligned on the substrate with an edge part of the nano frame of FIG. 4 coated with a hydrophobic polymer.
"FIG. 7 shows a flow diagram of an illustrative embodiment of a method for forming a nano pattern of the block co-polymer aligned on a substrate.
"FIG. 8 shows a block diagram of an illustrative embodiment of a computer/controller suitable to control the operations of the method illustrated in FIG. 7."
For additional information on this patent application, see: LEE, Kwangyeol. Nano Pattern Formation. Filed
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