By a News Reporter-Staff News Editor at Life Science Weekly -- Research findings on Chalcogens are discussed in a new report. According to news reporting from Tianjin, People's Republic of China, by NewsRx journalists, research stated, "Surface morphology, microstructure, magnetic and transport properties of nonuniform Co0.53Ti0.47O delta nanocomposite films fabricated by reactive cosputtering have been investigated. We change the oxygen partial pressure (P-O) to modulate the oxygen concentration in the films."
The news correspondents obtained a quote from the research from the Tianjin University of Technology, "The average surface roughness first decreases, and then increases with the increase of P-O. The films are composed of Co-0, Co2+, Ti3+, Ti4+ and O-2 ions, and small metal Co grains appear. The saturation magnetization of the films decreases with the increase of P-O, which can be ascribed to the antiferromagnetic superexchange interaction between Co2+-O-2 Co2+ since the number of Co2+-O-2 Co2+ may increase with the increased P-O. The resistivity of the samples decreases with the increase of temperature, showing a semiconducting mechanism. The room-temperature resistivity increases with P-O, following a relation of log rho = A log P-O."
According to the news reporters, the research concluded: "Magnetoresistance (MR) of the films saturated at a field of 10 kOe, and varies with the measuring temperature with a relation of log MR = C log T, where at P-O < 2.5% MR increases, but at P-O >= 2.5% MR decreases with the increase of temperature."
For more information on this research see: Role of oxygen concentration on ferromagnetism and electronic transport properties of Co0.53Ti0.47O delta nanocomposite films. Journal of Alloys and Compounds, 2014;589():436-442. Journal of Alloys and Compounds can be contacted at: Elsevier Science Sa, PO Box 564, 1001 Lausanne, Switzerland. (Elsevier - www.elsevier.com; Journal of Alloys and Compounds - www.elsevier.com/wps/product/cws_home/522468)
Our news journalists report that additional information may be obtained by contacting X.C. Wang, Tianjin Univ Technol, Sch Elect Informat Engn, Tianjin Key Lab Film Elect & Communicate Devices, Tianjin 300384, People's Republic of China. Additional authors for this research include J. Zhou, R.X. Liu, Y.T. Bai, M.Y. Yin, X.M. Chen and B.H. Yang (see also Chalcogens).
Keywords for this news article include: Asia, Tianjin, Chalcogens, People's Republic of China
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