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Study Findings from Chung Hua University Broaden Understanding of Halogens

February 7, 2014

By a News Reporter-Staff News Editor at Science Letter -- Data detailed on Halogens have been presented. According to news reporting from Hsinchu, Taiwan, by NewsRx journalists, research stated, "The improvements to electrical properties of SiGe nanowires by surface plasma treatment were investigated. Various durations of pre-oxidation with fluorine; ambients for post-nitridation plasma treatment, and annealing temperature after plasma treatment, 800-950 degrees C, were applied."

The news correspondents obtained a quote from the research from Chung Hua University, "Pre-oxidation treatment using fluorine plasma; improved the conductance of SiGe nanowires because the Si-F binding energy created a more stable interface state than bare nanowire on the surface of SiGe. N-2 plasma incorporated more N than does in NH3 plasma, and NH3 has the drawback of introducing electron traps, causing Si-H bonds to break in the subsequent annealing process. Since the reparation of surface defects by plasma treatment is valid, the high post-annealing temperature to reduce defect by re-crystallizing can be reduced."

According to the news reporters, the research concluded: "Hence, Ge diffusion at low post-annealing temperature did not reduce the high concentration of Ge at the SiGe nanowire surfaces."

For more information on this research see: Electrical properties of SiGe nanowire following fluorine/nitrogen plasma treatment. Applied Surface Science, 2014;289():581-585. Applied Surface Science can be contacted at: Elsevier Science Bv, PO Box 211, 1000 Ae Amsterdam, Netherlands. (Elsevier -; Applied Surface Science -

Our news journalists report that additional information may be obtained by contacting K.M. Chang, Chung Hua Univ, Dept. of Elect Engn, Hsinchu 300, Taiwan. Additional authors for this research include C.F. Chen, C.H. Lai, P.S. Kuo, Y.M. Chen and T.Y. Chang (see also Halogens).

Keywords for this news article include: Asia, Taiwan, Hsinchu, Fluorine, Halogens, Nanowire, Nitrogen, Treatment, Nanotechnology, Emerging Technologies

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Source: Science Letter

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