By a News Reporter-Staff News Editor at Science Letter -- Investigators publish new report on Chalcogens. According to news originating from Wuhan, People's Republic of China, by NewsRx correspondents, research stated, "Etching with oxygen ions produced by ECR plasma with an asymmetric magnetic mirror field was investigated as a potential technique for polishing CVD diamond. The morphology, structure and roughness of the diamond film surface before and after etching were analyzed respectively using scanning electron microscope (SEM), Raman spectroscopy and surface roughness measuring instrument."
Our news journalists obtained a quote from the research from the School of Materials Science and Engineering, "It was found that the ridges on diamond surface had been preferentially etched away and thereby the surface roughness decreased from 3.061 to 1.083 pin after 4 h etching. Meanwhile, non-diamond phase appeared on surface and dramatically increased with the extending of etching time. In order to fundamentally understand the etching mechanism, an etching model of diamond film was reasonably proposed on the ground of the experimental results and the theory of plasma physics. The as-generated ions taking screw movement are firstly accelerated along the magnetic field lines in the plasma and collisional presheath, and then deflected from their route towards the diamond film in the MP. When coming into Debye sheath, the motion of ions will be deflected further and strongly accelerated by electric field in the direction normal to the (1 1 1) crystal facets."
According to the news editors, the research concluded: "This process gave rise to energetic ion bombardment towards every (1 1 1) crystal face, and thereby caused preferential etching of pyramidal crystallites."
For more information on this research see: Etching of CVD diamond films using oxygen ions in ECR plasma. Applied Surface Science, 2014;289():533-537. Applied Surface Science can be contacted at: Elsevier Science Bv, PO Box 211, 1000 Ae Amsterdam, Netherlands. (Elsevier - www.elsevier.com; Applied Surface Science - www.elsevier.com/wps/product/cws_home/505669)
The news correspondents report that additional information may be obtained from Z.B. Ma, Wuhan Inst Technol, Sch Mat Sci & Engn, Prov Key Lab Plasma Chem & Adv Mat, Wuhan 430073, People's Republic of China. Additional authors for this research include J. Wu, W.L. Shen, L. Yan, X. Pan and J.H. Wang (see also Chalcogens).
Keywords for this news article include: Asia, Wuhan, Chalcogens, Nanotechnology, Plasma Etching, Emerging Technologies, People's Republic of China
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