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Patent Issued for Method of Nanoimprinting a Piezoelectric Polymeric Material for Forming High Aspect Ratio Nanopillars

February 5, 2014



By a News Reporter-Staff News Editor at Journal of Engineering -- According to news reporting originating from Alexandria, Virginia, by VerticalNews journalists, a patent by the inventors Hong, Chien-Chong (Zhubei, TW); Huang, Sheng-Yuan (Xinbei, TW), filed on August 5, 2011, was published online on January 21, 2014.

The assignee for this patent, patent number 8632717, is National Tsing Hua University (Hsinchu, TW).

Reporters obtained the following quote from the background information supplied by the inventors: "The invention relates to a method of nanoimprinting a piezoelectric polymeric material using a nanoimprinting template under an imprinting temperature less than the Curie temperature of the piezoelectric polymeric material for forming high aspect ratio nanopillars.

"Piezoelectric materials can be used for making transducers, and include ceramic type and polymeric type piezoelectric materials. In 'Flexible Dome and Bump Shape Piezoelectric Tactile Sensors Using PVDF-TrFE Copolymer,' Journal of Microelectromechanical Systems, 2008, 17, 334-341, Chunyan Li et al. disclose a sensor made from a piezoelectric material having a microstructure that can improve the sensitivity of the sensor. The microstructure is in micro scale and is formed by spin-coating techniques.

"In 'Large Area High Density Sub-20 nm SiO.sub.2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography,' 2009 American Chemical Society, Vol. 3, No. 9, 2601-2608, 2009, Park et al. disclose a nanoimprinting method for forming large area high density sub-20 nanometer nanopillars or nanoholes. The conventional method can form sub-20 nanometer nanopillars or nanoholes on materials, such as polymethyl methacrylate (PMMA), poly(dimethylsiloxane) (PDMS), and poly(3-hexylthiophene) (P3HT). However, the conventional method can only produce nanopillars having a low aspect ratio (up to 2.5 only). In the field of material science, an aspect ratio of less than 5 is considered as a low aspect ratio.

"In addition, it is commonly known in the art that when it is desired to form pillars on a material, the imprinting template used for imprinting is required to have holes formed therein, and when it is desired to form holes in the material, the imprinting template is required to have pillars formed thereon."

In addition to obtaining background information on this patent, VerticalNews editors also obtained the inventors' summary information for this patent: "The object of the present invention is to provide a method of nanoimprinting a piezoelectric polymeric material that can form high aspect ratio nanopillars.

"According to the present invention, there is provided a method of nanoimprinting a piezoelectric polymeric material for forming high aspect ratio nanopillars. The method includes: heating a surface of the piezoelectric polymeric material to an imprinting temperature greater than (T.sub.c-25).degree. C. and less than T.sub.c, in which T.sub.c is the Curie temperature of the piezoelectric polymeric material; and pressing the heated surface of the piezoelectric polymeric material using a nanoimprinting template having a nanopillar structure so as to form the piezoelectric polymeric material with high aspect ratio nanopillars."

For more information, see this patent: Hong, Chien-Chong; Huang, Sheng-Yuan. Method of Nanoimprinting a Piezoelectric Polymeric Material for Forming High Aspect Ratio Nanopillars. U.S. Patent Number 8632717, filed August 5, 2011, and published online on January 21, 2014. Patent URL: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=70&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=3455&f=G&l=50&co1=AND&d=PTXT&s1=20140121.PD.&OS=ISD/20140121&RS=ISD/20140121

Keywords for this news article include: National Tsing Hua University.

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Source: Journal of Engineering


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