Notice Type: Sources Sought Notice
Subject: SOURCES SOUGHT: Field Emission Scanning Electron Microscope (FESEM)
Classification Code: 66 - Instruments & laboratory equipment
Solicitation Number: AMD-14-SS09
Place of Performance Country: US
CNST seeks an ultra-high resolution FESEM to provide fundamental multi-scale morphological and physical information for tracking wafer processing parameters during nanofabrication. This microscope will provide additional SEM imaging capability in the CNST NanoFab for imaging materials on the nanometer and micrometer scale during nanofabrication. The system must be capable of high resolution imaging of nonconductive samples, including photoresist-coated wafers and quartz wafers.
1. GENERAL This FESEM is intended to be used by NanoFab users who need to quickly perform inspection of wafers during nanofabrication. The FESEM must have excellent low voltage performance for imaging nonconductive samples and have the ability to image wafers up to 200 mm (8 inch) in diameter. The microscope shall have an extremely stable gun that is capable of operating 24 hours a day, 7 days a week. The FESEM will be installed in a vertical laminar flow, class 100 cleanroom, and will therefore require environmental isolation.
2. BASE MICROSCOPE a. The microscope shall have a minimum resolution of 1.0 nm at 15 kV and 1.5 nm at 1 kV. b. The microscope shall be capable of operating with probe currents between 1 pA (or less) and 200 nA (or greater). c. The microscope shall have a beam flux with variability less than or equal to 1 % over 24 hours. d. The microscope shall be equipped with beam deceleration and stage biasing technology. e. The microscope shall be equipped with both lower and upper secondary detectors, and in-lens secondary and backscatter detectors. f. The microscope shall be equipped with a five axis stage. g. The microscope chamber shall be able to accommodate up to a 200 mm (8 inch) diameter wafer with travel of at least 140 mm and 80 mm in the x and y directions respectively.
3. SYSTEM ACCESSORIES a. The system shall be equipped with an in situ plasma cleaner capable of cleaning the chamber and sample. b. The system shall be equipped with passive and active vibration isolation systems that reduce ambient random and periodic noise to limits suitable for the microscope and occupies a foot print no larger than the SEM base and an active AC field cancelation system.
NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company's size classification and socio-economic status in any response to this notice.
Companies that manufacture SEMs are requested to email a detailed report describing their abilities to email@example.com no later than the response date for this sources sought notice. The report should include achievable specifications and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice:
1. Name of the company that manufactures the system components for which specifications are provided.
2. Name of company(s) that are authorized to sell the system components, their addresses, and a point of contact for the company (name, phone number, fax number and email address).
3. Indication of number of days, after receipt of order that is typical for delivery of such systems.
4. Indication of whether each instrument for which specifications are sent to firstname.lastname@example.org is currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s).
5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research.
Point of contact
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