MAHWAH, N.J., Sept. 16, 2013 (GLOBE NEWSWIRE) -- Radware® (Nasdaq:RDWR), a leading provider of application delivery and application security solutions for virtual and cloud data centers, today announced that Chunghwa System Integration Company, Ltd., has selected Radware'sAlteon® 4408 application delivery controller (ADC) with AppShape™++ as well as its ADC Fabric™ to help its customers receive additional value from VMware® Horizon View™, a virtual desktop infrastructure.
Chunghwa System Integration, a wholly owned subsidiary of Chunghwa Telecom in Taiwan, is a leading system integration company that offers advanced business solutions to financial, public & government, telecom and high-tech manufacturing industries.
Chunghwa System Integration chose Radware based on its proven performance and the combined solution of its Alteon 4408 and VMware's Horizon View which has been tested and validated. Radware's Alteon 4408 ensures the availability, performance and security of the mission critical applications in the data center. Its AppShape++ technology delivers scripting capabilities that allows customization of the ADC service per specific application flow and scenario, and its ADC Fabric transforms physical ADCs from "units" or devices into services, regardless of the underlying computing resources.
In addition, Chunghwa System Integration recognizes Radware's unique values including increased business agility and operational efficiency through Radware's ADC solution with VMware's virtualization infrastructure.
"There is a demand for a robust, fully secure solution with a high level of availability to ensure maximum uptime and productivity," said Mr. Eason Lin, sales director at Chunghwa System Integration. "Our decision to select Radware's ADC was based on the exacting needs of our customers and enables us to meet their expectations by providing a hassle-free, on-demand scalable platform. Additionally, Radware's AppShape++ technology allows us to leverage a scripts example library to refine various layer 4-7 policies with no application modifications, to help reduce cost and risk," added Lin.