VistaPrint Technologies Assigned Patent
The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method and system are disclosed for automatically generating embroidery designs. A described method includes segmenting image data into a plurality of objects including a first object, recursively generating fragments from the first object to generate an order in which the fragments are to be sewn, the order to reduce thread cuts or increase path connectivity between the fragments, and generating an image output file representative of an embroidery design based on the fragments and the order."
The patent application was filed on
Tokyo Electron Assigned Patent
The abstract of the patent published by the U.S. Patent and Trademark Office states: "The invention provides a systems and methods for creating Double Pattern (DP) structures on a patterned wafer in real-time using Dual Pattern Contact-Etch (DPCE) processing sequences and associated Contact-Etch-Multi-Input/Multi-Output (CE-MIMO) models. The DPCE processing sequences can include one or more contact-etch procedures, one or more measurement procedures, one or more contact-etch modeling procedures, and one or more contact-etch verification procedures. The CE-MIMO model uses dynamically interacting behavioral modeling between multiple layers and/or multiple contact-etch procedures. The multiple layers and/or the multiple contact-etch procedures can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created during Double Patterning (DP) procedures."
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