Meaglow Ltd. (Privately Held) announces the installation of a hollow cathode plasma source for the group of Professor Necmi Biyikli, of the Institute of Materials Science and Nanotechnology, at Bilkent University in Turkey. The plasma source is being used to upgrade their Atomic Layer Deposition (ALD) system by replacing an inductively coupled plasma source. This enhancement will reduce the oxygen contamination in ALD systems and increase the quality of Nitride thin films grown. "The Bilkent system was easy to retrofit and the Meaglow Plasma source was the perfect solution for their oxygen contamination problem." Says Dr. Butcher, Chief Scientist of Meaglow. Initial results show a significant reduction of oxygen content in compound Nitride films grown. Results will be presented October 27th-November 1st at the 224th ECS Fall Meeting in San Francisco, CA at an invited talk presented at the symposium on "Atomic Layer Deposition Applications".