By a News Reporter-Staff News Editor at Journal of Technology -- New research on Thin Solid Films is the subject of a report. According to news reporting originating in Tainan, Taiwan, by VerticalNews journalists, research stated, "The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 degrees C to form tungsten oxide films with nanostructure."
The news reporters obtained a quote from the research from National Cheng Kung University, "The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 degrees C are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 degrees C and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 degrees C exhibit high transmission modulation (Delta T similar to 40%) at lambda = 633 nm and good kinetic properties."
According to the news reporters, the research concluded: "As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated."
For more information on this research see: Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films. Thin Solid Films, 2013;549():258-262. Thin Solid Films can be contacted at: Elsevier Science Sa, PO Box 564, 1001 Lausanne, Switzerland. (Elsevier - www.elsevier.com; Thin Solid Films - www.elsevier.com/wps/product/cws_home/504106)
Our news correspondents report that additional information may be obtained by contacting C.L. Wu, National Cheng Kung University, Res Center Energy Technol & Strategy, Tainan 701, Taiwan. Additional authors for this research include C.K. Lin, C.K. Wang, S.C. Wang and J.L. Huang.
Keywords for this news article include: Asia, Tainan, Taiwan, Thin Solid Films
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