By a News Reporter-Staff News Editor at Science Letter -- A new study on Materials Science and Physical Chemistry is now available. According to news reporting out of Beijing, People's Republic of China, by NewsRx editors, research stated, "This paper reports a novel single-step wafer-level fabrication of superhydrophobic micro/nano dual-scale (MNDS) poly(dimethylsiloxane) (PDMS) films. The MNDS PDMS films were replicated directly from an ultralow-surface-energy silicon substrate at high temperature without any surfactant coating, achieving high precision."
Our news journalists obtained a quote from the research from Peking University, "An improved deep reactive ion etching (DRIE) process with enhanced passivation steps was proposed to easily realize the ultralow-surface-energy MNDS silicon substrate and also utilized as a post-treatment process to strengthen the hydrophobicity of the MNDS PDMS film. The chemical modification of this enhanced passivation step to the surface energy has been studied by density functional theory, which is also the first investigation of C4F8 plasma treatment at molecular level by using first-principle calculations. From the results of a systematic study on the effect of key process parameters (i.e., baking temperature and time) on PDMS replication, insight into the interaction of hierarchical multiscale structures of polymeric materials during the micro/nano integrated fabrication process is experimentally obtained for the first time. Finite element simulation has been employed to illustrate this new phenomenon. Additionally, hierarchical PDMS pyramid arrays and V-shaped grooves have been developed and are intended for applications as functional structures for a light-absorption coating layer and directional transport of liquid droplets, respectively."
According to the news editors, the research concluded: "This stable, self-cleaning PDMS film with functional micro/nano hierarchical structures, which is fabricated through a wafer-level single-step fabrication process using a reusable silicon mold, shows attractive potential for future applications in micro/nanodevices, especially in micro/nanofluidics."
For more information on this research see: Self-Cleaning Poly(dimethylsiloxane) Film with Functional Micro/Nano Hierarchical Structures. Langmuir, 2013;29(34):10769-10775. Langmuir can be contacted at: Amer Chemical Soc, 1155 16TH St, NW, Washington, DC 20036, USA. (American Chemical Society - www.acs.org; Langmuir - www.pubs.acs.org/journal/langd5)
Our news journalists report that additional information may be obtained by contacting X.S. Zhang, Peking University, Natl Key Lab Nano Micro Fabricat Technol, Inst Microelect, Beijing 100871, People's Republic of China. Additional authors for this research include F.Y. Zhu, M.D. Han, X.M. Sun, X.H. Peng and H.X. Zhang (see also Materials Science and Physical Chemistry).
Keywords for this news article include: Asia, Beijing, Silicon, Treatment, People's Republic of China, Materials Science and Physical Chemistry
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