By a News Reporter-Staff News Editor at Journal of Technology -- Researchers detail new data in Thin Solid Films. According to news reporting originating in Guildford, United Kingdom, by VerticalNews journalists, research stated, "The effects of high dose Ar ion irradiation on immiscible AlN/TiN multilayered structures were studied. The structures with 30 alternate layers of a total thickness of similar to 260 nm were deposited by reactive sputtering on (100) Si wafers."
The news reporters obtained a quote from the research from the University of Surrey, "Individual layer thickness was similar to 8 nm AlN and similar to 9.3 nm TiN. Irradiation was done with 180 keV Ar+ ions to 1x10(16)-8x10(16) ions/cm(2), with the projected range around mid-depth of the structures. It was found that the highest applied dose induced a considerable intermixing, where the growing TiN grains consume the adjacent AlN layers, transforming partly to (TiAl)N phase. Intermixing occurs due to a high contribution of collision cascades, which was not compensated in demixing by chemical driving forces. However, a multilayered structure with relatively flat surface and interfaces is still preserved, with measured nano-hardness value above the level for the as-deposited sample. The results are compared to other systems and discussed in the light of the existing ion beam mixing models."
According to the news reporters, the research concluded: "They can be interesting towards better understanding of the processes involved and to development of radiation tolerant coatings."
For more information on this research see: High dose ion irradiation effects on immiscible AlN/TiN nano-scaled multilayers. Thin Solid Films, 2013;544():562-566. Thin Solid Films can be contacted at: Elsevier Science Sa, PO Box 564, 1001 Lausanne, Switzerland. (Elsevier - www.elsevier.com; Thin Solid Films - www.elsevier.com/wps/product/cws_home/504106)
Our news correspondents report that additional information may be obtained by contacting M. Milosavljevic, University of Surrey, Surrey Ion Beam Center, Guildford GU2 7XH, Surrey, United Kingdom. Additional authors for this research include M. Obradovic, A. Grce, D. Perusko, D. Pjevic, J. Kovac, G. Drazic and C. Jeynes.
Keywords for this news article include: Europe, Guildford, United Kingdom, Thin Solid Films
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